Etching mechanisms of low-k SiOCH and selectivity to SiCH and SiO[sub 2] in fluorocarbon based plasmas
N. Posseme, T. Chevolleau, O. Joubert, L. Vallier, P. MangiagalliYear:
2003
Language:
english
DOI:
10.1116/1.1627337
File:
PDF, 630 KB
english, 2003