Etching mechanisms of low-k SiOCH and selectivity to SiCH...

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Etching mechanisms of low-k SiOCH and selectivity to SiCH and SiO[sub 2] in fluorocarbon based plasmas

N. Posseme, T. Chevolleau, O. Joubert, L. Vallier, P. Mangiagalli
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Year:
2003
Language:
english
DOI:
10.1116/1.1627337
File:
PDF, 630 KB
english, 2003
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