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Influence of residual solvent in polymers patterned by nanoimprint lithography
C. Gourgon, J. H. Tortai, F. Lazzarino, C. Perret, G. Micouin, O. Joubert, S. LandisYear:
2004
Language:
english
DOI:
10.1116/1.1651554
File:
PDF, 707 KB
english, 2004