Influence of residual solvent in polymers patterned by...

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Influence of residual solvent in polymers patterned by nanoimprint lithography

C. Gourgon, J. H. Tortai, F. Lazzarino, C. Perret, G. Micouin, O. Joubert, S. Landis
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Year:
2004
Language:
english
DOI:
10.1116/1.1651554
File:
PDF, 707 KB
english, 2004
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