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Comparison of a new photoresist (DiaPlate 133) with SU-8 using both x-ray and ion beam lithographies
Y. Gonin, F. Munnik, F. Benninger, F. Dias, S. Mikhaı̈lovYear:
2004
Language:
english
DOI:
10.1116/1.1763896
File:
PDF, 894 KB
english, 2004