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Optimization of post-N[sub 2] treatment and undoped-Si-glass cap to improve metal wring delamination in deep submicron high-density plasma-fluorinated silica glass intermetal dielectric application
Y. Cheng, Y. Wang, J. Lan, S. Wu, S. Chang, K. Lo, M. FengYear:
2004
Language:
english
DOI:
10.1116/1.1767107
File:
PDF, 705 KB
english, 2004