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Nanoimprint lithography in the cyclic olefin copolymer, Topas[sup ®], a highly ultraviolet-transparent and chemically resistant thermoplast
T. Nielsen, D. Nilsson, F. Bundgaard, P. Shi, P. Szabo, O. Geschke, A. KristensenYear:
2004
Language:
english
DOI:
10.1116/1.1771665
File:
PDF, 1.02 MB
english, 2004