Etching of porous SiOCH materials in fluorocarbon-based...

  • Main
  • Etching of porous SiOCH materials in...

Etching of porous SiOCH materials in fluorocarbon-based plasmas

N. Posseme, T. Chevolleau, O. Joubert, L. Vallier, N. Rochat
How much do you like this book?
What’s the quality of the file?
Download the book for quality assessment
What’s the quality of the downloaded files?
Year:
2004
Language:
english
DOI:
10.1116/1.1815316
File:
PDF, 838 KB
english, 2004
Conversion to is in progress
Conversion to is failed