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Cleaning of extreme ultraviolet lithography optics and masks using 13.5 nm and 172 nm radiation
K. Hamamoto, Y. Tanaka, T. Watanabe, N. Sakaya, M. Hosoya, T. Shoki, H. Hada, N. Hishinuma, H. Sugahara, H. KinoshitaYear:
2005
Language:
english
DOI:
10.1116/1.1849220
File:
PDF, 969 KB
english, 2005