Using Ni masks in inductively coupled plasma etching of...

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Using Ni masks in inductively coupled plasma etching of high density hole patterns in GaN

D. S. Y. Hsu, C. S. Kim, C. R. Eddy, R. T. Holm, R. L. Henry, J. A. Casey, V. A. Shamamian, A. Rosenberg
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Year:
2005
Language:
english
DOI:
10.1116/1.1978896
File:
PDF, 715 KB
english, 2005
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