In situ chemical sensing in AlGaN∕GaN high electron mobility transistor metalorganic chemical vapor deposition process for real-time prediction of product crystal quality and advanced process control
S. Cho, G. W. Rubloff, M. E. Aumer, D. B. Thomson, D. P. Partlow, R. Parikh, R. A. AdomaitisYear:
2005
Language:
english
DOI:
10.1116/1.1993616
File:
PDF, 949 KB
english, 2005