Experimental investigation of tunnel oxide thickness on...

  • Main
  • Experimental investigation of tunnel...

Experimental investigation of tunnel oxide thickness on charge transport through Si nanocrystal dot floating gate memories

P. Punchaipetch, K. Ichikawa, Y. Uraoka, T. Fuyuki, A. Tomyo, E. Takahashi, T. Hayashi
How much do you like this book?
What’s the quality of the file?
Download the book for quality assessment
What’s the quality of the downloaded files?
Year:
2006
Language:
english
DOI:
10.1116/1.2198852
File:
PDF, 733 KB
english, 2006
Conversion to is in progress
Conversion to is failed