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Electron-beam lithography of Co∕Pd multilayer with hydrogen silsesquioxane and amorphous Si intermediate layer
J. Wi, T. Lee, K. Jin, D. H. Hong, K. H. Shin, K. KimYear:
2006
Language:
english
DOI:
10.1116/1.2366615
File:
PDF, 778 KB
english, 2006