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Influence of base additives on the reaction-diffusion front of model chemically amplified photoresists
B. D. Vogt, S. Kang, V. M. Prabhu, A. Rao, E. K. Lin, W. Wu, S. K. Satija, K. TurnquestYear:
2007
Language:
english
DOI:
10.1116/1.2429675
File:
PDF, 757 KB
english, 2007