![](/img/cover-not-exists.png)
Study of plasma-induced damage of porous ultralow-k dielectric films during photoresist stripping
S. Xu, C. Qin, L. Diao, D. Gilbert, L. Hou, A. Wiesnoski, E. Busch, R. Mcgowan, B. White, F. WeberYear:
2007
Language:
english
DOI:
10.1116/1.2431349
File:
PDF, 731 KB
english, 2007