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Nanopattern transfer to SiO[sub 2] by ion track lithography and highly selective HF vapor etching
M. Skupiński, J. Jensen, A. Johansson, G. Possnert, M. Boman, K. Hjort, A. RazpetYear:
2007
Language:
english
DOI:
10.1116/1.2738481
File:
PDF, 840 KB
english, 2007