Etching SiO[sub 2] with HF/pyridine-supercritical carbon...

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Etching SiO[sub 2] with HF/pyridine-supercritical carbon dioxide solutions and resultant interfacial electronic properties

Y. X. Li, D. Yang, C. A. Jones, J. M. Desimone, E. A. Irene
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Year:
2007
Language:
english
DOI:
10.1116/1.2743651
File:
PDF, 584 KB
english, 2007
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