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Optimized fabrication of silicon nanofocusing x-ray lenses using deep reactive ion etching
O. Kurapova, B. Lengeler, C. G. Schroer, M. Küchler, T. Gessner, A. Van Der HartYear:
2007
Language:
english
DOI:
10.1116/1.2769361
File:
PDF, 601 KB
english, 2007