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Process characterization of inductively coupled plasma etched silicon nanopillars by micro-Raman
G. M. Laws, A. Handugan, T. Eschrich, P. Boland, C. Sinclair, S. Myhajlenko, C. D. PoweleitYear:
2007
Language:
english
DOI:
10.1116/1.2781514
File:
PDF, 872 KB
english, 2007