Latest results from the SEMATECH Berkeley extreme ultraviolet microfield exposure tool
P. P. Naulleau, C. N. Anderson, J. Chiu, K. Dean, P. Denham, S. George, K. A. Goldberg, B. Hoef, G. Jones, C. Koh, B. La Fontaine, A. Ma, W. Montgomery, D. Niakoula, J. Park, T. Wallow, S. WurmYear:
2009
Language:
english
DOI:
10.1116/1.3043473
File:
PDF, 1021 KB
english, 2009
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