Study of interface degradation of Hf-silicate gate...

  • Main
  • Study of interface degradation of...

Study of interface degradation of Hf-silicate gate dielectrics during thermal nitridation process

S. Y. Son, J. H. Jang, P. Kumar, R. K. Singh, J. H. Yuh, H. Cho, C. J. Kang
How much do you like this book?
What’s the quality of the file?
Download the book for quality assessment
What’s the quality of the downloaded files?
Year:
2009
Language:
english
DOI:
10.1116/1.3043536
File:
PDF, 819 KB
english, 2009
Conversion to is in progress
Conversion to is failed