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Study of interface degradation of Hf-silicate gate dielectrics during thermal nitridation process
S. Y. Son, J. H. Jang, P. Kumar, R. K. Singh, J. H. Yuh, H. Cho, C. J. KangYear:
2009
Language:
english
DOI:
10.1116/1.3043536
File:
PDF, 819 KB
english, 2009