Plasma reactor dry cleaning strategy after TaC, MoN, WSi,...

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Plasma reactor dry cleaning strategy after TaC, MoN, WSi, W, and WN etching processes

R. Ramos, G. Cunge, O. Joubert, T. Lill
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Year:
2009
Language:
english
DOI:
10.1116/1.3058710
File:
PDF, 1.34 MB
english, 2009
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