High density plasma etching of titanium nitride metal gate...

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High density plasma etching of titanium nitride metal gate electrodes for fully depleted silicon-on-insulator subthreshold transistor integration

S. A. Vitale, J. Kedzierski, C. L. Keast
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Year:
2009
Language:
english
DOI:
10.1116/1.3253533
File:
PDF, 1.38 MB
english, 2009
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