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Study of Ti etching and selectivity mechanism in fluorocarbon plasmas for dielectric etch
F. Weilnboeck, E. Bartis, S. Shachar, G. S. Oehrlein, D. Farber, T. Lii, C. LenoxYear:
2012
Language:
english
DOI:
10.1116/1.3690643
File:
PDF, 1.28 MB
english, 2012