Level-set-based inverse lithography for mask synthesis...

Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures 2013 Vol. 31; Iss. 4

Level-set-based inverse lithography for mask synthesis using the conjugate gradient and an optimal time step

Lv, Wen, Liu, Shiyuan, Xia, Qi, Wu, Xiaofei, Shen, Yijiang, Lam, Edmund Y.
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Volume:
31
Year:
2013
Language:
english
Journal:
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
DOI:
10.1116/1.4813781
File:
PDF, 3.39 MB
english, 2013
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