Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures
2013 Vol. 31; Iss. 6
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Stochastic exposure kinetics of extreme ultraviolet photoresists: Trapping model
Mack, Chris A., Biafore, John J., Smith, Mark D.Volume:
31
Year:
2013
Language:
english
Journal:
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
DOI:
10.1116/1.4823759
File:
PDF, 1.80 MB
english, 2013