Ashing of photoresists using dielectric barrier discharge...

Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures 2013 Vol. 31; Iss. 6

Ashing of photoresists using dielectric barrier discharge cryoplasmas

Stauss, Sven, Mori, Shusaku, Muneoka, Hitoshi, Terashima, Kazuo, Iacopi, Francesca
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Volume:
31
Year:
2013
Language:
english
Journal:
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
DOI:
10.1116/1.4825202
File:
PDF, 1.99 MB
english, 2013
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