Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures
2013 Vol. 31; Iss. 6
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Active-matrix nanocrystalline Si electron emitter array with a function of electronic aberration correction for massively parallel electron beam direct-write lithography: Electron emission and pattern transfer characteristics
Ikegami, Naokatsu, Koshida, Nobuyoshi, Kojima, Akira, Ohyi, Hideyuki, Yoshida, Takashi, Esashi, MasayoshiVolume:
31
Year:
2013
Language:
english
Journal:
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
DOI:
10.1116/1.4827819
File:
PDF, 2.41 MB
english, 2013