Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures
2013 Vol. 31; Iss. 6
Simulation of dose variation and charging due to fogging in electron beam lithography
Babin, Sergey, Borisov, Sergey, Patyukova, ElenaVolume:
31
Year:
2013
Language:
english
Journal:
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
DOI:
10.1116/1.4829435
File:
PDF, 2.22 MB
english, 2013