Patterning of silicon nitride for CMOS gate spacer...

Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures 2014 / 03 Vol. 32; Iss. 2

Patterning of silicon nitride for CMOS gate spacer technology. II. Impact of subsilicon surface carbon implantation on epitaxial regrowth

Blanc, Romuald, Jenny, Cécile, Lagrasta, Sébastien, Leverd, François, Joubert, Olivier
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Volume:
32
Language:
english
Journal:
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
DOI:
10.1116/1.4865896
Date:
March, 2014
File:
PDF, 1.65 MB
english, 2014
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