Epitaxial, well-ordered ceria/lanthana high-k gate...

Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures 2014 / 05 Vol. 32; Iss. 3

Epitaxial, well-ordered ceria/lanthana high-k gate dielectrics on silicon

Flege, Jan Ingo, Kaemena, Björn, Schmidt, Thomas, Falta, Jens
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Volume:
32
Language:
english
Journal:
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
DOI:
10.1116/1.4876122
Date:
May, 2014
File:
PDF, 1.94 MB
english, 2014
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