Leakage current and structural analysis of annealed...

Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures 2014 / 05 Vol. 32; Iss. 3

Leakage current and structural analysis of annealed HfO2/La2O3 and CeO2/La2O3 dielectric stacks: A nanoscopic study

Shubhakar, Kalya, Pey, Kin Leong, Bosman, Michel, Kushvaha, Sunil Singh, O'Shea, Sean Joseph, Kouda, Miyuki, Kakushima, Kuniyuki, Iwai, Hiroshi
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Volume:
32
Language:
english
Journal:
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
DOI:
10.1116/1.4876335
Date:
May, 2014
File:
PDF, 2.35 MB
english, 2014
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