![](/img/cover-not-exists.png)
Smooth and anisotropic reactive ion etching of GaAs slot via holes for monolithic microwave integrated circuits using Cl[sub 2]/BCl[sub 3]/Ar plasmas
K. J. Nordheden, X. D. Hua, Y. S. Lee, L. W. Yang, D. C. Streit, H. C. YenYear:
1999
Language:
english
DOI:
10.1116/1.590540
File:
PDF, 667 KB
english, 1999