![](/img/cover-not-exists.png)
Remote microwave plasma source for cleaning chemical vapor deposition chambers: Technology for reducing global warming gas emissions
S. Raoux, T. Tanaka, M. Bhan, H. Ponnekanti, M. Seamons, T. Deacon, L. Xia, F. Pham, D. Silvetti, D. Cheung, K. Fairbairn, A. Jonhson, R. Pearce, J. LanganYear:
1999
Language:
english
DOI:
10.1116/1.590580
File:
PDF, 655 KB
english, 1999