Nondestructive technique for the characterization of deep...

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Nondestructive technique for the characterization of deep traps at interlayer interfaces in thin-film multilayer semiconductor structures

J. González-hernández, E. Prokhorov, N. B. Gorev, I. F. Kodzhespirova, Y. A. Kovalenko
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Year:
1999
Language:
english
DOI:
10.1116/1.590918
File:
PDF, 417 KB
english, 1999
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