Study of bilayer silylation process for 193 nm lithography...

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Study of bilayer silylation process for 193 nm lithography using chemically amplified resist

I. Satou, K. Kuhara, M. Endo, H. Morimoto
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Year:
1999
Language:
english
DOI:
10.1116/1.591005
File:
PDF, 1.02 MB
english, 1999
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