Maskless micro-ion-beam reduction lithography

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Maskless micro-ion-beam reduction lithography

V. V. Ngo, W. Barletta, R. Gough, Y. Lee, K. N. Leung, N. Zahir, D. Patterson
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Year:
1999
Language:
english
DOI:
10.1116/1.591065
File:
PDF, 912 KB
english, 1999
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