Front end of line considerations for progression beyond the...

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Front end of line considerations for progression beyond the 100 nm node ultrashallow junction requirements

C. Rinn Cleavelin, B. C. Covington, L. A. Larson
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Year:
2000
Language:
english
DOI:
10.1116/1.591196
File:
PDF, 437 KB
english, 2000
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