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In situ etching and regrowth in III–V molecular beam epitaxy for future nanotechnology
H. Schuler, M. Keller, M. Lipinski, K. Eberl, J. Weis, K. V. KlitzingYear:
2000
Language:
english
DOI:
10.1116/1.591347
File:
PDF, 877 KB
english, 2000