SPIE Proceedings [SPIE SPIE Advanced Lithography - San...

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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 22 February 2015)] Advances in Patterning Materials and Processes XXXII - Tailored molecular glass resists for scanning probe lithography

Wallow, Thomas I., Hohle, Christoph K., Neuber, Christian, Schmidt, Hans-Werner, Strohriegl, Peter, Ringk, Andreas, Kolb, Tristan, Schedl, Andreas, Fokkema, Vincent, van Veghel, Marijn G. A., Cooke, M
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Volume:
9425
Year:
2015
Language:
english
DOI:
10.1117/12.2085734
File:
PDF, 650 KB
english, 2015
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