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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, CA (Sunday 22 February 2009)] Metrology, Inspection, and Process Control for Microlithography XXIII - Automated defect review of the wafer bevel with a defect review scanning electron microscope
McGarvey, Steve, Kanezawa, Masakazu, Allgair, John A., Raymond, Christopher J.Volume:
7272
Year:
2009
Language:
english
DOI:
10.1117/12.814235
File:
PDF, 2.32 MB
english, 2009