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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, CA (Sunday 22 February 2009)] Advances in Resist Materials and Processing Technology XXVI - Message to the undecided: using DUV dBARC for 32 nm node implants
Lee, Hyung-Rae, Popova, Irene Y., Rolick, JoAnn M., Gomez, Juan-Manuel, Bailey, Todd C., Henderson, Clifford L.Volume:
7273
Year:
2009
Language:
english
DOI:
10.1117/12.814269
File:
PDF, 1.04 MB
english, 2009