SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 21 February 2010)] Metrology, Inspection, and Process Control for Microlithography XXIV - Defect metrology challenges at the 11-nm node and beyond
Crimmins, Timothy F., Raymond, Christopher J.Volume:
7638
Year:
2010
Language:
english
DOI:
10.1117/12.846623
File:
PDF, 393 KB
english, 2010