SPIE Proceedings [SPIE SPIE/OSA/IEEE Asia Communications and Photonics - Shanghai, China (Sunday 13 November 2011)] Optoelectronic Materials and Devices VI - Patterning effect mitigation using complementary data for NRZ wavelength conversion with a SOA-MZI
Wang, Gang, Yang, Xuelin, Weng, Qiwei, Hu, Weisheng, Duan, Guang-HuaVolume:
8308
Year:
2011
Language:
english
DOI:
10.1117/12.904084
File:
PDF, 512 KB
english, 2011