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AIP Conference Proceedings [AIP ION IMPLANTATION TECHNOLOGY 2101: 18th International Conference on Ion Implantation Technology IIT 2010 - Kyoto, (Japan) (6–11 June 2010)] - Luminescence Studies of Residual Damage in Low-Dose Arsenic Implanted Silicon after High-Temperature Annealing
Sagara, Akihiko, Hiraiwa, Miori, Shibata, Satoshi, Sugie, Ryuichi, Yamada, Keiichi, Matsuo, Jiro, Kase, Masataka, Aoki, Takaaki, Seki, ToshioYear:
2011
Language:
english
DOI:
10.1063/1.3548355
File:
PDF, 513 KB
english, 2011