Reaction kinetics during the thermal activation of the...

Applied Physics Letters 2014 / 02 Vol. 104; Iss. 6

Reaction kinetics during the thermal activation of the silicon surface passivation with atomic layer deposited Al2O3

Richter, Armin, Benick, Jan, Hermle, Martin, Glunz, Stefan W.
How much do you like this book?
What’s the quality of the file?
Download the book for quality assessment
What’s the quality of the downloaded files?
Volume:
104
Language:
english
Journal:
Applied Physics Letters
DOI:
10.1063/1.4865901
Date:
February, 2014
File:
PDF, 548 KB
english, 2014
Conversion to is in progress
Conversion to is failed