Platinum Etching and Plasma Characteristics in RF Magnetron...

Japanese Journal of Applied Physics 1993 / 12 Vol. 32; Iss. Part 1, No

Platinum Etching and Plasma Characteristics in RF Magnetron and Electron Cyclotron Resonance Plasmas

Nishikawa, Kazuyasu, Kusumi, Yoshihiro, Oomori, Tatsuo, Hanazaki, Minoru, Namba, Keisuke
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Volume:
32
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.32.6102
Date:
December, 1993
File:
PDF, 1.33 MB
1993
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