Reactive Ion Beam Etching and Overgrowth Process in the...

Japanese Journal of Applied Physics 1998 / 3 Vol. 37; Iss. Part 1, No

Reactive Ion Beam Etching and Overgrowth Process in the Fabrication of InGaN Inner Stripe Laser Diodes

Nunoue, Shin-ya, Yamamoto, Masahiro, Suzuki, Mariko, Nozaki, Chiharu, Nishio, Joji, Sugiura, Lisa, Onomura, Masaaki, Itaya, Kazuhiko, Ishikawa, Masayuki
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Volume:
37
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.37.1470
Date:
March, 1998
File:
PDF, 856 KB
1998
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