Aqueous-based photoresist drying using supercritical carbon dioxide to prevent pattern collapse
D. L. Goldfarb, J. J. De Pablo, P. F. Nealey, J. P. Simons, W. M. Moreau, M. AngelopoulosYear:
2000
Language:
english
DOI:
10.1116/1.1313582
File:
PDF, 577 KB
english, 2000