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Maskless lithography using low-energy electron beam: Recent results for proof-of-concept system
T. Nakasugi, A. Ando, R. Inanami, N. Sasaki, T. Ota, O. Nagano, Y. Yamazaki, K. Sugihara, I. Mori, M. Miyoshi, K. Okumura, H. FujiokaYear:
2002
Language:
english
DOI:
10.1116/1.1520562
File:
PDF, 1.36 MB
english, 2002