Etching of TiN-based gates for advanced complementary metal-oxide-semiconductor devices
V. Bliznetsov, N. Singh, R. Kumar, N. Balasubramanian, P. Guo, S. J. Lee, Y. CaiYear:
2008
Language:
english
DOI:
10.1116/1.2953732
File:
PDF, 960 KB
english, 2008