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Self-aligned patterning on a flexible substrate using a dual-tone, thermally activated photoresist
W. K. Jen, B. M. Rawlings, J. R. Strahan, D. J. Hellebusch, W. J. Durand, C. Grant WillsonYear:
2012
Language:
english
DOI:
10.1116/1.3669380
File:
PDF, 1.75 MB
english, 2012